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tert-Butoxycarbonylated, fractionated cresol-formaldehyde novolac (tBOC-N) was investigated as a dual-tone, chemically amplified, deep-u.v, and electron-beam resist. The protected polymer is highly transparent at 2 > 240 nm, and thermally stable up to 170°C. Negative-tone, 75-nm line-and-space patterns were obtained in the tBOC-N-based resist by electron-beam lithography. The deprotected novolac was insoluble in aqueous bases, possibly because of acid-catalysed alkylation reaction.

Посилання на статтю:

tert-Butoxycarbonylated novolacs as chemically amplified dual-tone resists / Antoni S. Gozdz* and John A. Shelburne // Polymer. – 1992. – Vol 33. – P. 4653-4655.

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