Model network polymers derived from narrow distribution ct,og-dihydroxypoly(propylene oxide) and a triisocyanate, tris(4-isocyanatophenyl)thiophosphate, were used. Dielectric relaxation measurements were carried out on these networks with different molecular weights between crosslink points. Two relaxation processes were identified and the complex permittivity was assumed to be the sum of two Havriliak-Negami contributions to obtain relaxation parameters. The relaxation strength of the higher frequency process was found to be proportional to the estimated concentration of the ether oxygen group, on the other hand, the relaxation strength of the lower frequency process was found to be proportional to that of the urethane group. From this result, it is reasonable to consider that the higher frequency process is due to motions involving the ether oxygen group and the lower frequency process is due to motions involving the urethane group.
Посилання на статтю:
Dielectric relaxation of model network polymers / Kimio Ichikawa* and William J. MacKnightt // Polymer. – 1992. – Vol 33. – P. 4693-4698.