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Photoablation of spun polystyrene films was studied at 248 nm. The etching occurs on a submicrosecond time-scale, is strongly intensity dependent and is preceded by an incubation period. The chemical and photochemical properties of the polymer are not affected by its molecular weight. However the molecular weight changes the incubation behaviour of the samples. This last result is analysed as a physical effect in terms of the volume changes brought about by the ablation process.

Посилання на статтю:

Molecular weight effects on the 248-nm photoablation of polystyrene spun films / P. Lernoine, W. Blau*, A. Drury and C. Keely // Polymer. – 1993. – Vol 34. – P. 5020-5028.

Molecular weight effects on the 248-nm photoablation of polystyrene spun films - Завантажити.